Imaging polymers with supercritical carbon dioxide
- Christopher K. Ober
- Allen H. Gabor
- et al.
- 1997
- Advanced Materials
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99 results for Robert Allen
Photoresists for 193-nm lithography
- R.D. Allen
- G.M. Wallraff
- et al.
- 1997
- IBM J. Res. Dev
The influence of photoacid structure on the design and performance of 193-nm resists
- Robert D. Allen
- Juliann Opitz
- et al.
- 1997
- J. Photopolym. Sci. Tech.
Synthesis of polyester graft copolymers via the macromonomer technique: Application of near-IR spectroscopy as a process monitor
- T.E. Long
- R.D. Allen
- et al.
- 1996
- American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
193 nm photoresist r&d: the risk & challenge
- Donald C. Hofer
- Robert Allen
- et al.
- 1996
- J. Photopolym. Sci. Tech.
Progress in 193 nm positive resists
- R.D. Allen
- R. Soortyakumaran
- et al.
- 1996
- J. Photopolym. Sci. Tech.
Performance properties of near-monodisperse novolak resins
- R.D. Allen
- K.J. Chen
- et al.
- 1995
- Microlithography 1995
193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system
- R.D. Allen
- G.M. Wallraff
- et al.
- 1995
- Microlithography 1995
Resolution and etch resistance of a family of 193 nm positive resists
- R.D. Allen
- I.Y. Wan
- et al.
- 1995
- J. Photopolym. Sci. Tech.
Materials evaluation of antireflective coatings for single-layer 193-nm lithography
- Roderick R. Kunz
- Robert D. Allen
- 1994
- Microlithography 1994