EUV single exposure via patterning at aggressive pitch
- Jing Guo
- Jennifer Church
- et al.
- 2021
- SPIE Advanced Lithography 2021
Publications
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52 results for Luciana Meli
Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features
- A. Dutta
- Jennifer Church
- et al.
- 2020
- SPIE Advanced Lithography 2020
Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance
- Chris Robinson
- Cody Murray
- et al.
- 2020
- SPIE Advanced Lithography 2020
Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch
- Jennifer Church
- Luciana Meli
- et al.
- 2020
- SPIE Advanced Lithography 2020
Measuring Local CD Uniformity in EUV vias with scatterometry and machine learning
- Dexin Kong
- Daniel Schmidt
- et al.
- 2020
- SPIE Advanced Lithography 2020
Material and process improvements towards sub 36nm pitch EUV single exposure
- Karen Petrillo
- Dave Hetzer
- et al.
- 2019
- ANTS 2019
LCDU improvement of EUV-patterned vias with DSA
- Jing Guo
- Dustin W. Janes
- et al.
- 2019
- MEMS/NEMS/MOEMS 2019
Investigation of mask absorber induced image shift in EUV lithography
- Martin Burkhardt
- Anuja De Silva
- et al.
- 2019
- SPIE Advanced Lithography 2019
Fundamentals of resist stochastics effect for single-expose EUV patterning
- Anuja De Silva
- Luciana Meli
- et al.
- 2019
- SPIE Advanced Lithography 2019
EUV mask challenges and requirements for ultimate single exposure interconnects
- Chris Progler
- Michael Green
- et al.
- 2019
- SPIE Advanced Lithography 2019