Scaling opportunities for Gate-All-Around: A patterning perspective
- I. Seshadri
- E. Miller
- et al.
- 2023
- IEDM 2023
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52 results for Luciana Meli
Scaling opportunities for Gate-All-Around and beyond: A patterning perspective
- Indira Seshadri
- Eric Miller
- et al.
- 2023
- IEDM 2023
EUV patterned gate variation reduction in next generation transistor architectures
- Gopal Kenath
- Martin Burkhardt
- et al.
- 2024
- SPIE Advanced Lithography + Patterning 2024
Epi Source-Drain Damage Mitigation During Channel Release of Stacked Nanosheet Gate-All-Around Transistors
- Curtis Durfee
- Ivo Otto
- et al.
- 2023
- ECS Meeting 2023
Epi Source/Drain Damage Mitigation with Inner Spacer and Buffer Optimization in Stacked Nanosheet Gate-All-Around Transistors
- Curtis Durfee
- Ivo Otto
- et al.
- 2023
- SSDM 2023
EUV sub-resolution assist feature impact: experimental and simulation evaluation
- Zheng Chen
- Martin Burkhardt
- et al.
- 2023
- OEN 2023
Overlay Performance in Permanent Bonded Wafer Integration Schemes
- Nathan Ip
- Michael Belyansky
- et al.
- 2023
- SPIE Advanced Lithography + Patterning 2023
Focus considerations of design pitches and absorber choice for EUV random logic
- Martin Burkhardt
- Zheng Chen
- et al.
- 2022
- OEN 2022
Exploring the stochastics cliff: Understanding the impact of LER/LWR to stochastic defectivity and yield
- Jennifer Church
- Graham Jensen
- et al.
- 2021
- SPIE Photomask Technology + EUV Lithography 2021
A holistic characterization methodology for stochastic printing failures in EUV contact holes
- Jennifer Church
- Brad Austin
- et al.
- 2021
- ASMC 2021