Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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13 results for Eric Miller

Scaling opportunities for Gate-All-Around: A patterning perspective
- - I. Seshadri
  - E. Miller
  - et al.
- 2023
- IEDM 2023
Functional Testing of AI Cores through Thinned 3D I/O Buffer Dies in 3D Die-Stacked Modules
- - Mukta Farooq
  - Arvind Kumar
  - et al.
- 2022
- ECTC 2022
Vertical-Transport Nanosheet Technology for CMOS Scaling beyond Lateral-Transport Devices
- - H. Jagannathan
  - B. Anderson
  - et al.
- 2021
- IEDM 2021
Technology viable DC performance elements for Si/SiGe channel CMOS FinFTT
- - G. Tsutsui
  - Ruqiang Bao
  - et al.
- 2016
- IEDM 2016
A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels
- - Ruilong Xie
  - Pietro Montanini
  - et al.
- 2016
- IEDM 2016
Contact local CD uniformity optimization through etch shrink
- - Eric Miller
  - Junling Sun
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch
- - Jennifer Church
  - Luciana Meli
  - et al.
- 2020
- SPIE Advanced Lithography 2020
SiGe FinFET for practical logic libraries by mitigating local layout effect
- - G. Tsutsui
  - Huimei Zhou
  - et al.
- 2017
- VLSI Technology 2017
EUV patterning successes and frontiers
- - Nelson Felix
  - Daniel Corliss
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Advanced in-line metrology strategy for self-aligned quadruple patterning
- - Robin Chao
  - Mary Breton
  - et al.
- 2016
- SPIE Advanced Lithography 2016