Mechanistic studies of chemically amplified photoresists
- W.D. Hinsberg
- G.M. Wallraff
- et al.
- 1997
- American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
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101 results for Gregory M. Wallraff
DNA sequencing on a chip
- G.M. Wallraff
- T. Nguyen
- et al.
- 1997
- CHEMTECH
Photoresists for 193-nm lithography
- R.D. Allen
- G.M. Wallraff
- et al.
- 1997
- IBM J. Res. Dev
Correlation of UVIIHS resist chemistry to dissolution rate measurements
- J. Thackeray
- T.H. Fedynyshyn
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Kinetics of thermal and acid-catalyzed deprotection in deep-UV resist materials
- G.M. Wallraff
- John M. Hutchinson
- et al.
- 1995
- Microelectronic Engineering
193 nm resists and lithography
- Roderick R. Kunz
- Robert D. Allen
- et al.
- 1994
- Polymers for Advanced Technologies
Polymeric silicon‐containing resist materials
- R.D. Miller
- G.M. Wallraff
- 1994
- Advanced Materials for Optics and Electronics
Fluorescence quenching of poly(methylphenylsilane) in solution
- Gregory M. Wallraff
- Mark Baier
- et al.
- 1992
- Journal of Inorganic and Organometallic Polymers
Models for polysilane high polymers. Room-temperature solution fluorescence quenching in linear Si10Me22, Si16Me34 and poly(methylpropylsilane) by carbon tetrachloride
- Ya-Ping Sun
- Gregory M. Wallraff
- et al.
- 1992
- Journal of Photochemistry and Photobiology, A: Chemistry
The solution and solid-state thermochromism of unsymmetrically substituted polysilanes
- R.D. Miller
- G.M. Wallraff
- et al.
- 1991
- Journal of Inorganic and Organometallic Polymers