Polysilane photoresists for 193 and 248 nm lithography
- G.M. Wallraff
- R.D. Miller
- et al.
- 1992
- J. Photopolym. Sci. Tech.
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101 results for Gregory M. Wallraff
The electronic structure of high molecular weight substituted silane polymers in solution: Fluorescence quenching studies
- R.D. Miller
- M. Baier
- et al.
- 1992
- Pure and Applied Chemistry
The solution and solid-state thermochromism of unsymmetrically substituted polysilanes
- R.D. Miller
- G.M. Wallraff
- et al.
- 1991
- Journal of Inorganic and Organometallic Polymers
Polysilanes. Synthesis, structure and thermochromic behavior
- R.D. Miller
- G.M. Wallraff
- et al.
- 1991
- ACS Division of Polymer Chemistry Atlanta Meeting 1991
Solution Photochemistry of Poly(di-n-alkylsilane)s. An EPR-ENDOR Study of the Structure of the Persistent Radicals
- Allan J. McKinley
- Takashi Karatsu
- et al.
- 1991
- JACS
Structure of dialkyl and diaryl substituted organosilane polymers in solution
- P.M. Cotts
- P. Shukla
- et al.
- 1990
- ACS Division of Polymer Chemistry Washington DC Meeting 1990
Resolution of the nuclear and electronic contributions to the optical nonlinearity in polysilanes
- Daniel J. McGraw
- A.E. Siegman
- et al.
- 1989
- Applied Physics Letters
Polysilanes: solution photochemistry and deep UV lithography
- R.D. Miller
- G.M. Wallraff
- et al.
- 1988
- ACS PMSE 1988
Relationship of photoacid production and fluorescence quenching of anthryl sensitizers by aryl iodonium and sulfonium salts
- G.M. Wallraff
- D.R. McKean
- et al.
- 1989
- ACS PMSE 1989
Thermochromic behavior of unsymmetrical poly(alkylsilanes)
- G.M. Wallraff
- M. Baier
- et al.
- 1989
- ACS Division of Polymer Chemistry Miami Beach Meeting 1989