Studies of Chain Conformational Kinetics in Poly(di-n-alkylsilanes). 5. The Effect of Side-Chain Structure on Piezochromism
- K. Song
- R.D. Miller
- et al.
- 2002
- Macromolecules
Publications
Date
Featured collections
Popular topics
101 results for Gregory M. Wallraff
Spectroscopic Characterization of Piezochromism in Poly(Alkylsilanes): Poly(di-o-hexylsilane)
- K. Song
- H. Kuzmany
- et al.
- 2002
- Macromolecules
Mechanistic studies of the acidolysis reactions occurring in silicon-containing bilayer photoresists
- Ilya Zharov
- Josef Michl
- et al.
- 2002
- Chemistry of Materials
The effect of humidity on deprotection kinetics in chemically amplified resists
- Sean D. Burns
- David R. Medeiros
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Fluoropolymers for 157/193 nm lithography: Chemistry, new platform, formulation strategy, and lithographic evaluation
- Hiroshi Ito
- H.D. Truong
- et al.
- 2002
- J. Photopolym. Sci. Tech.
Aliphatic platforms for the design of 157 nm chemically amplified resists
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Characterization and acid diffusion measurements of new strong acid photoacid generators
- G.M. Wallraff
- Carl E. Larson
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Fluoropolymer platforms for 157 nm resist applications
- Hiroshi Ito
- G.M. Wallraff
- et al.
- 2001
- International Conference on Microprocesses and Nanotechnology 2001
Characterization of new aromatic polymers for 157 nm photoresist applications
- N. Fender
- P.J. Brock
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Polymer design for 157 nm chemically amplified resists
- Hiroshi Ito
- Greg M. Wallraff
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering