Polysilanes: solution photochemistry and deep UV lithography
- R.D. Miller
- G.M. Wallraff
- et al.
- 1988
- ACS PMSE 1988
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101 results for Gregory M. Wallraff
Relationship of photoacid production and fluorescence quenching of anthryl sensitizers by aryl iodonium and sulfonium salts
- G.M. Wallraff
- D.R. McKean
- et al.
- 1989
- ACS PMSE 1989
Thermochromic behavior of unsymmetrical poly(alkylsilanes)
- G.M. Wallraff
- M. Baier
- et al.
- 1989
- ACS Division of Polymer Chemistry Miami Beach Meeting 1989
Polysilanes: photochemistry and deep UV lithography
- R.D. Miller
- G.M. Wallraff
- et al.
- 1988
- SPE Regional Technical Conference 1988
Fundamental understanding of chemical processes in extreme ultraviolet resist materials
- Oleg Kostko
- Bo Xu
- et al.
- 2018
- Journal of Chemical Physics
Reactive monolayers in directed additive manufacturing – area selective atomic layer deposition
- Rudy J. Wojtecki
- Anuja DeSilva
- et al.
- 2018
- J. Photopolym. Sci. Tech.
Investigation of polymer-bound PAGs: Synthesis, characterization and initial structure/property relationships of anion-bound resists
- Robert D. Allen
- Phillip J. Brock
- et al.
- 2009
- J. Photopolym. Sci. Tech.
Solution photochemistry of poly(dialkylsilanes): A new class of photoresists
- Josef Michl
- John W. Downing
- et al.
- 2009
- Pure and Applied Chemistry
Design of protective topcoats for immersion lithography
- Robert D. Allen
- Phillip J. Brock
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Fluoropolymers for 157/193 nm lithography: Chemistry, new platform, formulation strategy, and lithographic evaluation
- Hiroshi Ito
- H.D. Truong
- et al.
- 2002
- J. Photopolym. Sci. Tech.