Conductive layer for charge dissipation during electron-beam exposures
- Luisa D. Bozano
- Ratnam Sooriyakumaran
- et al.
- 2012
- SPIE Photomask Technology + EUV Lithography 2012
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66 results for Martha I. Sanchez
EUV mask line edge roughness
- Amy E. Zweber
- Emily Gallagher
- et al.
- 2012
- SPIE Advanced Lithography 2012
Conductive layer for charge dissipation during electron-beam exposures
- Luisa D. Bozano
- Ratnam Sooriyakumaran
- et al.
- 2012
- Proceedings of SPIE - The International Society for Optical Engineering 2012
Bound PAG resists: An EUV and electron beam lithography performance comparison of fluoropolymers
- Luisa D. Bozano
- Phillip J. Brock
- et al.
- 2011
- SPIE Advanced Lithography 2011
Impact of curing kinetics and materials properties on imprint characteristics of resists for UV nanoimprint lithography
- Frances A. Houle
- Ann Fornof
- et al.
- 2007
- SPIE Advanced Lithography 2007
Patterning ∼20 nm half-pitch lines on silicon using a self-assembled organosilicate etch mask
- Linnea Sundström
- Leslie Krupp
- et al.
- 2006
- Applied Physics Letters
The Micro to Nano Addressing Block (MNAB)
- K. Gopalakrishnan
- R.S. Shenoy
- et al.
- 2005
- IEDM 2005
Studies of acid diffusion in low Ea chemically amplified photoresists
- G.M. Wallraff
- D. Medeiros
- et al.
- 2005
- Microlithography 2005
Contact mechanics of a flexible imprinter for photocured nanoimprint lithography
- G.M. McClelland
- C.T. Rettner
- et al.
- 2005
- Tribology Letters
Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist
- G.M. Wallraff
- D. Medeiros
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures