Strategies to enable directed self-Assembly contact hole shrink for tight pitches
- Kristin Schmidt
- Hitoshi Osaki
- et al.
- 2016
- SPIE Advanced Lithography 2016
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66 results for Martha I. Sanchez
ICE: Ionic contrast enhancement for organic solvent negative tone develop
- Linda K. Sundberg
- Gregory M. Wallraff
- et al.
- 2014
- SPIE Advanced Lithography 2014
Defects on high resolution negative-tone resist The revenge of the blobs
- M.I. Sanchez
- L.K. Sundberg
- et al.
- 2013
- SPIE Photomask Technology + EUV Lithography 2013
Monitoring the evolution of Line Edge Roughness during resist development using an analog of quenched flow kinetics
- M.I. Sanchez
- L.K. Sundberg
- et al.
- 2013
- SPIE Advanced Lithography 2013
Conductive layer for charge dissipation during electron-beam exposures
- Luisa D. Bozano
- Ratnam Sooriyakumaran
- et al.
- 2012
- SPIE Photomask Technology + EUV Lithography 2012
EUV mask line edge roughness
- Amy E. Zweber
- Emily Gallagher
- et al.
- 2012
- SPIE Advanced Lithography 2012
Conductive layer for charge dissipation during electron-beam exposures
- Luisa D. Bozano
- Ratnam Sooriyakumaran
- et al.
- 2012
- Proceedings of SPIE - The International Society for Optical Engineering 2012
Bound PAG resists: An EUV and electron beam lithography performance comparison of fluoropolymers
- Luisa D. Bozano
- Phillip J. Brock
- et al.
- 2011
- SPIE Advanced Lithography 2011
Impact of curing kinetics and materials properties on imprint characteristics of resists for UV nanoimprint lithography
- Frances A. Houle
- Ann Fornof
- et al.
- 2007
- SPIE Advanced Lithography 2007
Studies of acid diffusion in low Ea chemically amplified photoresists
- G.M. Wallraff
- D. Medeiros
- et al.
- 2005
- Microlithography 2005