Experimental method for quantifying acid diffusion in chemically amplified resists
- G.M. Wallraff
- W.D. Hinsberg
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
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66 results for Martha I. Sanchez
Aerial image contrast using interferometric lithography: Effect on line-edge roughness
- M.I. Sanchez
- W.D. Hinsberg
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Structure-dielectric property relationships of thin polyimide films with nano-foam morphology
- H.J. Cha
- H. Lee
- et al.
- 1995
- SPE ANTEC 1995
Base-catalyzed photosensitive polyimide
- Dennis R. McKean
- Gregory M. Waliraff
- et al.
- 1993
- Microlithography 1993
Use of interferometric lithography to characterize the spatial resolution of a photoresist film
- John A. Hoffnagle
- William D. Hinsberg
- et al.
- 2003
- J. Photopolym. Sci. Tech.
Factors controlling pattern formation in chemically amplified resists at sub-100 nm dimensions
- W.D. Hinsberg
- F.A. Houle
- et al.
- 1999
- J. Photopolym. Sci. Tech.
Contribution of EUV resist counting statistics to stochastic printing failures
- William D. Hinsberg
- Gregory M. Wallraff
- et al.
- 2021
- JM3
Fundamental study of extreme UV resist line edge roughness: Characterization, experiment, and modeling
- Ramakrishnan Ayothi
- Lovejeet Singh
- et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Patterning ∼20 nm half-pitch lines on silicon using a self-assembled organosilicate etch mask
- Linnea Sundström
- Leslie Krupp
- et al.
- 2006
- Applied Physics Letters
Contact mechanics of a flexible imprinter for photocured nanoimprint lithography
- G.M. McClelland
- C.T. Rettner
- et al.
- 2005
- Tribology Letters