Ultra low contact resistivities for CMOS beyond 10-nm nodeZhen ZhangSiyuranga Obasa Koswattaet al.2013IEEE Electron Device Letters
Effective schottky barrier lowering for contact resistivity reduction using silicides as diffusion sourcesZhen ZhangF. Pagetteet al.2010VLSI-TSA 2010
Sharp reduction of contact resistivities by effective schottky barrier lowering with silicides as diffusion sourcesZhen ZhangF. Pagetteet al.2010IEEE Electron Device Letters