Lithographic techniques for the fabrication of oligonucleotide arrays
- G.M. Wallraff
- W.D. Hinsberg
- et al.
- 2000
- J. Photopolym. Sci. Tech.
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88 results for Phil Brock
Factors controlling pattern formation in chemically amplified resists at sub-100 nm dimensions
- W.D. Hinsberg
- F.A. Houle
- et al.
- 1999
- J. Photopolym. Sci. Tech.
Platform-dependent properties of 193nm single layer resists
- Robert D. Allen
- Thomas I. Wallow
- et al.
- 1998
- J. Photopolym. Sci. Tech.
193 nm photoresist r&d: the risk & challenge
- Donald C. Hofer
- Robert Allen
- et al.
- 1996
- J. Photopolym. Sci. Tech.
Integration of photo-patternable low-κ material into advanced Cu back-end-of-the-line
- Qinghuang Lin
- Alshakim Nelson
- et al.
- 2010
- Japanese Journal of Applied Physics
Imaging thin films of nanoporous low-k dielectrics: Comparison between ultramicrotomy and focused ion beam preparations for transmission electron microscopy
- Leslie E. Thompson
- Philip M. Rice
- et al.
- 2005
- Microscopy and Microanalysis
Pore size distributions in nanoporous methyl silsesquioxane films as determined by small angle x-ray scattering
- E. Huang
- M. Toney
- et al.
- 2002
- Applied Physics Letters
Aliphatic platforms for the design of 157 nm chemically amplified resists
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Evolution of a 193 nm bilayer resist for manufacturing
- R.W. Kwong
- M. Khojasteh
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Charge transport in TiO2/MEH-PPV polymer photovoltaics
- A.J. Breeze
- Z. Schlesinger
- et al.
- 2001
- Physical Review B - CMMP