Characterization and mechanism of He plasma pretreatment of nanoscale polymer masks for improved pattern transfer fidelity
- Florian Weilnboeck
- D. Metzler
- et al.
- 2011
- Applied Physics Letters
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117 results for Gottlieb S. Oehrlein
On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists
- R. Bruce
- Florian Weilnboeck
- et al.
- 2011
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma
- R. Bruce
- T. Lin
- et al.
- 2010
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Dependence of polymer surface roughening rate on deposited energy density during plasma processing
- Sebastian Engelmann
- Robert L. Bruce
- et al.
- 2009
- Plasma Processes and Polymers
Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C4 F 8 - And CF4 -based discharges
- S. Engelmann
- R. Bruce
- et al.
- 2009
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Studies of fluorocarbon film deposition and its correlation with etched trench sidewall angle by employing a gap structure using C4F 8Ar and CF4/H2 based capacitively coupled plasmas
- Li Ling
- X. Hua
- et al.
- 2008
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Mechanism of silicon surface roughening by reactive ion etching
- Gottlieb S. Oehrlein
- Robert G. Schad
- et al.
- 2004
- Surface and Interface Analysis
Study of near‐surface disorder and surface residues after reactive Ion etching of Silicon
- G.S. Oehrlein
- G.J. Coyle
- et al.
- 2004
- Surface and Interface Analysis
Gas utilization in remote plasma cleaning and stripping applications
- B.E. Kastenmeier
- G.S. Oehrlein
- et al.
- 2000
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fabrication and performance limits of sub-0.1 μm Cu interconnects
- T.S. Kuan
- C.K. Inoki
- et al.
- 2000
- Materials Research Society Symposium-Proceedings