Effects of deuterium plasmas on silicon near-surface properties
- J.L. Lindström
- G.S. Oehrlein
- et al.
- 1989
- Journal of Applied Physics
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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117 results for Gottlieb S. Oehrlein
A photoemission investigation of surface processes affecting the reactive ion etching of TiSi2 in CF4
- S.W. Robey
- M.A. Jaso
- et al.
- 1989
- Journal of Applied Physics
Rie-induced damage and contamination in silicon
- Young H. Lee
- G.S. Oehrlein
- et al.
- 1989
- Radiation Effects and Defects in Solids
Secondary ion mass spectrometry measurements of deuterium penetration into silicon by low pressure rf glow discharges
- Gottlieb S. Oehrlein
- Gerald J. Scilla
- 1989
- Radiation Effects and Defects in Solids
Fluorination of the silicon dioxide surface during reactive ion and plasma etching in halocarbon plasmas
- S.W. Robey
- G.S. Oehrlein
- 1989
- Surface Science
Tungsten etching mechanisms in CF4/O2 reactive ion etching plasmas
- Tim D. Bestwick
- Gottlieb S. Oehrlein
- 1989
- Journal of Applied Physics
Electrical studies on plasma and reactive-ion-etched silicon
- A. Henry
- O.O. Awadelkarim
- et al.
- 1989
- Journal of Applied Physics
Competitive reactions of fluorine and oxygen with W, WSi2, and Si surfaces in reactive ion etching using CF4/O2
- Gottlieb S. Oehrlein
- J. Lennart Lindsöm
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surface analysis of realistic semiconductor microstructures
- Gottlieb S. Oehrlein
- Kevin K. Chan
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Photoluminescence of defects introduced by deuterium plasmas in silicon
- H. Weman
- J.L. Lindström
- et al.
- 1989
- Materials Science and Engineering B