Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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94 results for Fenton R. McFeely

Low-energy-electron escape lengths in SiO2
- - F.R. McFeely
  - E. Cartier
  - et al.
- 1990
- Physical Review B
The chemisorption of chlorosilanes and chlorine on Si(111)7 × 7
- - L.J Whitman
  - S.A Joyce
  - et al.
- 1990
- Surface Science
Electron attenuation lengths at SiO₂/Si interfaces
- - J.A. Yarmoff
  - S.A. Joyce
  - et al.
- 1990
- Journal of Electron Spectroscopy and Related Phenomena
Si₂Cl₆and Si₂H₆adsorption on CaF₂/Si(111)
- - L.J. Terminello
  - F.J. Himpsel
  - et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The chemisorption of SiCl₄, Si₂Cl₆ and chlorine on Si(111) 7 × 7
- - L.J. Whitman
  - S.A. Joyce
  - et al.
- 1990
- Vacuum
Core-level photoemission investigation of atomic-fluorine adsorption on GaAs(110)
- - A.B. McLean
  - L.J. Terminello
  - et al.
- 1989
- Physical Review B
Soft x-ray photoemission study of downstream plasma enhanced chemical vapor deposited SiO₂
- - Bennett Robinson
  - F.R. McFeely
- 1989
- Journal of Applied Physics
The interaction of CF₃ radicals and CF₃ radical precursors with SiO₂ surfaces
- - F.R. McFeely
  - J.A. Yarmoff
  - et al.
- 1988
- Surface Science
Mechanism for chemical-vapor deposition of tungsten on silicon from tungsten hexafluoride
- - Jory A. Yarmoff
  - F. Read McFeely
- 1988
- Journal of Applied Physics
Microscopic structure of the SiO2/Si interface
- - F.J. Himpsel
  - F.R. McFeely
  - et al.
- 1988
- Physical Review B