Low-energy-electron escape lengths in SiO2
- F.R. McFeely
- E. Cartier
- et al.
- 1990
- Physical Review B
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94 results for Fenton R. McFeely
The chemisorption of chlorosilanes and chlorine on Si(111)7 × 7
- L.J Whitman
- S.A Joyce
- et al.
- 1990
- Surface Science
Electron attenuation lengths at SiO2/Si interfaces
- J.A. Yarmoff
- S.A. Joyce
- et al.
- 1990
- Journal of Electron Spectroscopy and Related Phenomena
Si2Cl6and Si2H6adsorption on CaF2/Si(111)
- L.J. Terminello
- F.J. Himpsel
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The chemisorption of SiCl4, Si2Cl6 and chlorine on Si(111) 7 × 7
- L.J. Whitman
- S.A. Joyce
- et al.
- 1990
- Vacuum
Core-level photoemission investigation of atomic-fluorine adsorption on GaAs(110)
- A.B. McLean
- L.J. Terminello
- et al.
- 1989
- Physical Review B
Soft x-ray photoemission study of downstream plasma enhanced chemical vapor deposited SiO2
- Bennett Robinson
- F.R. McFeely
- 1989
- Journal of Applied Physics
The interaction of CF3 radicals and CF3 radical precursors with SiO2 surfaces
- F.R. McFeely
- J.A. Yarmoff
- et al.
- 1988
- Surface Science
Mechanism for chemical-vapor deposition of tungsten on silicon from tungsten hexafluoride
- Jory A. Yarmoff
- F. Read McFeely
- 1988
- Journal of Applied Physics
Microscopic structure of the SiO2/Si interface
- F.J. Himpsel
- F.R. McFeely
- et al.
- 1988
- Physical Review B