A Scaled 0.25- μm Bipolar Technology Using Full e-Beam Lithography
- John D. Cressler
- James Warnock
- et al.
- 1992
- IEEE Electron Device Letters
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64 results for Denny Tang
Metal Migration into Polysilicon Emitter After Very High Current Stress
- Denny D. Tang
- Catherine Wong
- et al.
- 1992
- IEEE Electron Device Letters
High-Speed Low-Power ACCoupled Complementary Push-Pull ECL Circuit
- C.T. Chuang
- D.D. Tang
- 1992
- IEEE Journal of Solid-State Circuits
A novel high-performance lateral bipolar on SOI
- G. Shahidi
- D.D. Tang
- et al.
- 1991
- IEDM 1991
A full E-beam 0.25 mu m bipolar technology with sub-25 ps ECL gate delay
- J. Warnock
- J.D. Cressler
- et al.
- 1991
- IEDM 1991
High-Performance Bipolar Technology for Improved ECL Power Delay
- J. Warnock
- J.D. Cressler
- et al.
- 1991
- IEEE Electron Device Letters
A 26 ps self-aligned epitaxial silicon base bipolar technology
- J.H. Comfort
- P.F. Lu
- et al.
- 1990
- VLSI Technology 1990
The Implementation of a Reduced-Field Profile Design for High-Performance Bipolar Transistors
- Pong-Fei Lu
- James H. Comfort
- et al.
- 1990
- IEEE Electron Device Letters
Scaling The Silicon Bipolar Transistor For Sub-100-Ps Ecl Circuit Operation At Liquid Nitrogen Temperature
- John D. Cressler
- Tze-Chiang Chen
- et al.
- 1990
- IEEE T-ED
50-GHz Self-Aligned Silicon Bipolar Transistors with Ion-Implanted Base Profiles
- James Warnock
- John D. Cressler
- et al.
- 1990
- IEEE Electron Device Letters