Magnetic field control of reactive plasma etching
- V.J. Minkiewicz
- M. Chen
- et al.
- 2008
- Applied Physics Letters
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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51 results for J.W. Coburn
The etching of silicon with XeF2 vapor
- H.F. Winters
- J.W. Coburn
- 2008
- Applied Physics Letters
In situ Auger electron spectroscopy of Si and SiO2 surfaces plasma etched in CF4-H2 glow discharges
- J.W. Coburn
- 2008
- Journal of Applied Physics
Ion- and electron-assisted gas-surface chemistry - An important effect in plasma etching
- J.W. Coburn
- Harold F. Winters
- 2008
- Journal of Applied Physics
A method for increasing the etch-rate ratio of oxides to nonoxides in inert-gas ion milling processes
- U. Gerlach-Meyer
- J.W. Coburn
- et al.
- 2008
- Journal of Applied Physics
Optical emission spectroscopy of reactive plasmas: A method for correlating emission intensities to reactive particle density
- J.W. Coburn
- M. Chen
- 2008
- Journal of Applied Physics
Mechanisms in plasma-assisted etching
- J.W. Coburn
- 2007
- Physica Scripta
Tetrafluoromethane Injected into a dc Argon Glow Discharge
- J.W. Coburn
- Eric Kay
- 2006
- Journal of Macromolecular Science: Part A - Chemistry
Plasma Sources in Analytical Mass Spectrometry
- J.W. Coburn
- W.W. Harrison
- 2006
- Applied Spectroscopy Reviews
Plasma etching — a discussion of mechanisms
- J.W. Coburn
- Harold F. Winters
- 2006
- Critical Reviews in Solid State and Materials Sciences