Mass spectrometric studies of positive ions in r.f. glow discharges
- J.W. Coburn
- 1989
- Thin Solid Films
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51 results for J.W. Coburn
On the effect of low-energy ion bombardment on polystyrene and polymethylmethacrylate etch rates in rf plasmas
- E. Occhiello
- F. Garbassi
- et al.
- 1989
- Plasma Chemistry and Plasma Processing
Plasma-assisted etching of tungsten films: A quartz-crystal microbalance study
- F. Fracassi
- J.W. Coburn
- 1988
- Journal of Applied Physics
Effect of ion bombardment on the plasma-assisted etching and deposition of plasma perfluoropolymer thin films
- F. Fracassi
- E. Occhiello
- et al.
- 1987
- Journal of Applied Physics
The role of energetic ion bombardment in silicon-fluorine chemistry
- J.W. Coburn
- H.F. Winters
- 1987
- Nuclear Inst. and Methods in Physics Research, B
Ion-induced volatilization (IIV): A method for quantitative measurement of the amounts of perfluoropolyether lubricant on a particulate disk surface and in the media porosity
- J.W. Coburn
- H.F. Winters
- 1986
- Journal of Applied Physics
Quartz crystal microbalance simulation of the directionality of Si etching in CF4 glow discharges
- Natasha C.Us
- R.W. Sadowski
- et al.
- 1986
- Plasma Chemistry and Plasma Processing
Summary Abstract: Diagnostics in plasma processing
- J.W. Coburn
- 1986
- JVSTA
Pattern transfer
- J.W. Coburn
- 1986
- Superlattices and Microstructures
Plasma potentials of 13.56-MHz rf argon glow discharges in a planar system
- K. Köhler
- J.W. Coburn
- et al.
- 1985
- Journal of Applied Physics