Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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51 results for J.W. Coburn

Summary Abstract: Plasma potentials of 13.56 MHz rf argon glow discharges in a planar system
- - K. Kehler
  - J.W. Coburn
  - et al.
- 1985
- JVSTA
Frequency dependence of ion bombardment of grounded surfaces in rf argon glow discharges in a planar system
- - K. Köhler
  - D.E. Horne
  - et al.
- 1985
- Journal of Applied Physics
Plasma-assisted etching: Ion-assisted surface chemistry
- - J.W. Coburn
  - Harold F. Winters
- 1985
- Applications of Surface Science
Physical and chemical mechanisms in the ion-enhanced etching of silicon
- - JW Coburn
- 1984
- Vacuum
Summary Abstract: Surface processes in plasma-assisted etching environments
- - Harold F. Winters
  - J.W. Coburn
  - et al.
- 1983
- JVSTA
A SIMS study of ion-assisted etching mechanisms; adsorbed fluorine on Si removed by ion bombardment
- - E.-A. Knabbe
  - J.W. Coburn
  - et al.
- 1982
- Surface Science
Plasma-assisted etching
- - J.W. Coburn
- 1982
- Plasma Chemistry and Plasma Processing
Ion-enhanced gas-surface chemistry: The influence of the mass of the incident ion
- - U. Gerlach-Meyer
  - J.W. Coburn
  - et al.
- 1981
- Surface Science
The influence of ion sputtering on the elemental analysis of solid surfaces
- - J.W. Coburn
- 1979
- Thin Solid Films
An XPS and Auger investigation of CF⁺₃ ion bombardment of silicon
- - T.J. Chuang
  - H.F. Winters
  - et al.
- 1979
- Applications of Surface Science