An isotope approach to characterization of microwave water plasma modified polyimide surfaces
- N.J. Chou
- A.D. Marwick
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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29 results for N.J. Chou
RBS analysis of Si diffusion in photoresist during silylation
- P.B. Madakson
- S. Nunes
- et al.
- 1990
- Nuclear Inst. and Methods in Physics Research, B
Silylation of resist materials using di- and polyfunctional organosilicon compounds
- E. Babich
- J. Paraszczak
- et al.
- 1990
- Microelectronic Engineering
Chemical and physical aspects of multilayer resist processing
- J. Paraszczak
- E. Babich
- et al.
- 1989
- Proceedings of SPIE 1989
Local structure investigation of the ion sputtered oxide substrates
- Y.S. Chaug
- Y.H. Kim
- et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
X-ray photoelectron and infrared spectroscopy of microwave plasma etched polyimide surfaces
- N.J. Chou
- J. Paraszczak
- et al.
- 1987
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Interaction of Ti with fused silica and sapphire during metallization
- Y.S. Chaug
- N.J. Chou
- et al.
- 1987
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Adhesion of titanium thin film to oxide substrates
- Y.H. Kim
- Y.S. Chaug
- et al.
- 1987
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Mechanism of microwave plasma etching of polyimides in O2 and CF4 gas mixtures
- N.J. Chou
- J. Parazsczak
- et al.
- 1986
- Microelectronic Engineering
Mechanism of oxygen plasma etching of polydimethyl siloxane films
- N.J. Chou
- C.H. Tang
- et al.
- 1985
- Applied Physics Letters