Sidewall damage in n+-GaAs quantum wires from reactive ion etching
- R. Cheung
- Y.H. Lee
- et al.
- 1989
- Applied Physics Letters
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38 results for Y.H. Lee
Plasma characterization of an electron cyclotron resonance-radio-frequency hybrid plasma reactor
- Young H. Lee
- John E. Heidenreich
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
RADIAL DISTRIBUTION OF OXYGEN MOLECULAR IONS IN DIODE REACTOR.
- Y.H. Lee
- P.R. Brosious
- 1986
- Symposium on Plasma Processing 1986
Reactive ion etching related Si surface residues and subsurface damage: Their relationship to fundamental etching mechanisms
- Gottiieb S. Oehrlein
- Young H. Lee
- 1987
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Plasma-deposited fluorocarbon films on silicon studied by ellipsometry
- Gottlieb S. Oehrlein
- Ivar Reimanis
- et al.
- 1986
- Thin Solid Films
Summary Abstract: Reactive ion-etching-related Si surface residues and subsurface disorder
- G.S. Oehrlein
- J.G. Clabes
- et al.
- 1986
- JVSTA
Doping effects in reactive plasma etching of heavily doped silicon
- Young H. Lee
- Mao-Min Chen
- et al.
- 1985
- Applied Physics Letters
Silicon near-surface disorder and etch residues caused by CCIF 3/H2 reactive ion etching
- G.S. Oehrlein
- C.M. Ransom
- et al.
- 1985
- Applied Physics Letters
Study of silicon contamination and near-surface damage caused by CF 4/H2 reactive ion etching
- G.S. Oehrlein
- R.M. Tromp
- et al.
- 1984
- Applied Physics Letters
Exact description and data fitting of ion-implanted dopant profile evolution during annealing
- R. Ghez
- G.S. Oehrlein
- et al.
- 1984
- Applied Physics Letters