Lithographic performance of an EL-3 system at 0.25μm groundrules
- T. Newman
- M.G.R. Thomson
- et al.
- 1991
- Microelectronic Engineering
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A study of proximity effects at high electron-beam voltages for x-ray mask fabrication part 1: Additive mask processes
- Michael G. Rosenfield
- S. Rishton
- et al.
- 1991
- Microelectronic Engineering
Conducting polyaniline: Removable SEM discharge layer
- Marie Angelopoulos
- Jane M. Shaw
- et al.
- 1991
- Microelectronic Engineering
Periodic conductance resonances in one-dimensional GaAs channels with nanoconstrictions
- S.J. Wind
- U. Meirav
- et al.
- 1991
- Microelectronic Engineering
Light scattering properties of x-ray lithography mask substrates
- J.R. Maldonado
- Y. Vladimirsky
- et al.
- 1991
- Microelectronic Engineering
Comparison of vapor and liquid phase silylation processes of photoresists
- E. Babich
- J. Paraszczak
- et al.
- 1991
- Microelectronic Engineering
Device design issues for a high-performance technology with Si or SiGe epitaxial base
- J.N. Burghartz
- J.D. Cressler
- et al.
- 1991
- Microelectronic Engineering
MOVPE on patterned substrates: a new fabrication method for nanometer structure devices
- Yvan D. Galeuchet
- Hugo Rothuizen
- et al.
- 1991
- Microelectronic Engineering
Fabrication of sub-100nm dual-gate MODFETS with enhanced performance
- K.Y. Lee
- K. Ismail
- et al.
- 1991
- Microelectronic Engineering
Laser cleaning of wafer surfaces and lithography masks
- W. Zapka
- A.C. Tam
- et al.
- 1991
- Microelectronic Engineering