The use of organosilicon polymers in multilayer plasma resist processing
- J. Paraszczak
- E. Babich
- et al.
- 1987
- Microelectronic Engineering
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Photoemission sampling technique for high-speed integrated-circuit testing
- H. Beha
- H.K. Seitz
- et al.
- 1987
- Microelectronic Engineering
Electron beam / optical mixed lithography at half-micron ground rules
- P. Coane
- P. Rudeck
- et al.
- 1986
- Microelectronic Engineering
Silicon Micro Mechanics (SIMM): Si-beams with rectangular cross-section for atomic force sensing by means of STM
- O. Wolter
- J. Greschner
- et al.
- 1986
- Microelectronic Engineering
Scanning thermal profiler
- C.C. Williams
- H.K. Wickramasinghe
- 1986
- Microelectronic Engineering
High-temperature-stable Si3N4 dummy T-gate and lift-off mask
- P. Buchmann
- V. Graf
- et al.
- 1986
- Microelectronic Engineering
Scanning tunneling microscopy
- H. Salemink
- 1986
- Microelectronic Engineering
Ion energy and anisotropy in microwave plasma etching of polymers
- J. Heidenreich
- J. Paraszczak
- et al.
- 1986
- Microelectronic Engineering
Diazopolysiloxanes: Unique imageable barrier layers
- E. Babich
- J.M. Shaw
- et al.
- 1986
- Microelectronic Engineering
Mechanism of microwave plasma etching of polyimides in O2 and CF4 gas mixtures
- N.J. Chou
- J. Parazsczak
- et al.
- 1986
- Microelectronic Engineering