Energy and time-resolved photoemission in a promising new approach for contactless integrated-circuit testing
- H.K. Seitz
- A. Blacha
- et al.
- 1986
- Microelectronic Engineering
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221 results at Microelectronic Engineering
Background and applications of electron beam test techniques
- Fritz J. Hohn
- 1986
- Microelectronic Engineering
A comparison of the electron beam sensitivities and relative oxygen plasma etch rates of various organosilicon polymers
- E. Babich
- J. Paraszczak
- et al.
- 1985
- Microelectronic Engineering
Polysiloxanes for deep UV lithography
- J.M. Shaw
- M. Hatzakis
- et al.
- 1985
- Microelectronic Engineering
Distortion of masks for x-ray lithography
- R.E. Acosta
- J.R. Maldonado
- et al.
- 1985
- Microelectronic Engineering
Resist materials
- Scott A. MacDonald
- Jean M.J. Frechet
- et al.
- 1985
- Microelectronic Engineering
Lithographic image simulations
- Douglas S. Goodman
- 1985
- Microelectronic Engineering
Methods of creation and effect of microwave plasmas upon the etching of polymers and silicon
- J. Paraszczak
- J. Heidenreich
- et al.
- 1985
- Microelectronic Engineering
Characterization of stress in the absorber of x-ray masks using a holographic technique
- R.E. Acosta
- A.D. Wilson
- et al.
- 1985
- Microelectronic Engineering
Background and applications of electron beam test techniques
- Fritz J. Hohn
- 1985
- Microelectronic Engineering