Competitive reactions of fluorine and oxygen with W, WSi2, and Si surfaces in reactive ion etching using CF4/O2
- Gottlieb S. Oehrlein
- J. Lennart Lindsöm
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publications
3509 results for Materials Discovery
A process for improved Al (Cu) reactive ion etching
- C.-K. Hu
- B. Canney
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Radical formation and surface reaction induced by laser radiation in the C11212-Al system
- A. Modi
- K. Domen
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Plasma characterization for a divergent field electron cyclotron resonance source
- John Forster
- William Holber
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Electron spin resonance study of metal-nitride-silicon structures: Observation of Si dangling bonds with different configurations and trapping properties in silicon nitride
- D. Jousse
- Jerzy Kanicki
- et al.
- 1989
- Applied Surface Science
A study of the chemical and physical interaction between copper and polyimide
- D.Y. Shih
- J. Paraszczak
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Reaction kinetics of surface silicon hydrides
- C. Michael Greenlief
- Stephen M. Gates
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Structure of the Si(111)/CaF2 interface
- R.M. Tromp
- M.C. Reuter
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surface characterization of the copper-epoxy adhesion interface from production printed circuit boards
- P.C. Laberge
- C. Miller
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Mechanisms for success or failure of diffusion barriers between aluminum and silicon
- J.M.E. Harper
- S.E. Harnstram
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films