The role of oxygen in the development of Hf-base high-k/metal gate stacks for CMOS technologies
- E. Cartier
- 2010
- ECS Transactions
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33 results at ECS Transactions
III-V photovoltaics - Recent developments and prospects
- N. Sosa
- Theodore G. Van Kessel
- et al.
- 2010
- ECS Transactions
High-κ gate dielectrics for nanoscale CMOS devices: Status, challenges, and future
- Dae-Gyu Park
- Xinlin Wang
- 2010
- ECS Transactions
Investigation of band gap, band alignment and bonding states of the (TbxSc1-x)2O3/ Si system
- I. Geppert
- M. Eizenberg
- et al.
- 2010
- ECS Transactions
Integration of Germanium avalanche photodetectors on silicon for on-chip optical interconnects
- Solomon Assefa
- Fengnian Xia
- et al.
- 2010
- ECS Transactions
Deposition of copper on ruthenium for Cu metallization
- J. Kelly
- O. Van Der Straten
- et al.
- 2010
- ECS Transactions
Applications of epitaxy for semiconductor technology
- Devendra Sadana
- Stephen W. Bedell
- et al.
- 2010
- ECS Transactions
300mm cold-wall UHV/CVD reactor for low-temperature epitaxial (100) silicon
- Thomas N. Adam
- Stephen W. Bedell
- et al.
- 2010
- ECS Transactions
Ultimate EOT scaling (< 5Å) using Hf-based high-κ gate dielectrics and impact on carrier mobility
- Takashi Ando
- Martin M. Frank
- et al.
- 2010
- ECS Transactions
> 1020 cm-3 n-doping in Ge by Sb/P co-implants: n+/p Diodes with improved rectification
- Jeehwan Kim
- Stephen W. Bedell
- et al.
- 2010
- ECS Transactions