On the Nature of CVD Si-Rich SiO2 and Si3N4 Films
- E.A. Irene
- N.J. Chou
- et al.
- 2019
- JES
Publications
509 results at JES
Low Energy Ion Beam Etching
- J.M.E. Harper
- J.J. Cuomo
- et al.
- 2019
- JES
Dry Etching for VLSI—A Review
- L.M. Ephrath
- 2019
- JES
Anomalous Etch Structures Using Ethylenediamine-Pyrocatechol-Water Based Etchants and Their Elimination
- A. Reisman
- M. Berkenblit
- et al.
- 2019
- JES
Predicting Radiation Sensitivity of Polymers
- C.G. Willson
- K. Kinoshita
- 2019
- JES
Plasma Oxide FET Devices
- A. Ray
- A. Reisman
- 2019
- JES
Controlled Collapse Reflow for Josephson Chip Bonding
- C.-Y. Ting
- K.R. Grebe
- et al.
- 2019
- JES
Electrochemical Test to Evaluate Passivation Layers: Overcoats of Si in Ink
- M.H. Lee
- J.M. Eldridge
- et al.
- 2019
- JES
Electrical Properties of Al/Ti Contact Metallurgy for VLSI Application
- C.-Y. Ting
- B.L. Crowder
- 2019
- JES
Structural Composition of Polymers Relative to Their Plasma Etch Characteristics
- Lester A. Pederson
- 2019
- JES