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Anomalous Etch Structures Using Ethylenediamine-Pyrocatechol-Water Based Etchants and Their EliminationA. ReismanM. Berkenblitet al.2019JES
The Formation of SiO2 in an RF Generated Oxygen Plasma: II. The Pressure Range Above 10 mTorrA. RayA. Reisman2019JES
Effect of V2O3 Addition on the Thermoluminescence and Phosphorescence of Tb-Activated Garnet PhosphorsTakeshi TakamoriStephen Fineet al.2019JES
Effects of Several Parameters on the Corrosion Rates of Al Conductors in Integrated CircuitsIsrael LernerJerome M. Eldridge2019JES
The Fabrication of High Precision Nozzles by the Anisotropic Etching of (100) SiliconE. BassousE.F. Baran2019JES
Electron Beam-Induced Reactions of Orthonaphthoquinone-Diazide-Sulfonyl Derivatives in Phenolic-Type ResinsHiroyuki HiraokaAdolfo R. Gutierrez2019JES