Publications

8 results at Semiconductor International

Controlling and plasma- and process- induced damage
- - T.B. Hook
- 2001
- Semiconductor International
Designing porous low-k dielectrics
- - Josh H. Golden
  - Craig J. Hawker
  - et al.
- 2001
- Semiconductor International
Dedicated pre-clean reduces Epi's thermal budget
- - Arkadii V. Samoilov
  - Dale Du Bois
  - et al.
- 2000
- Semiconductor International
Plasma abatement reduces PFC emission
- - Victor Vartanian
  - Laurie Beu
  - et al.
- 2000
- Semiconductor International
Progress in 193 nm photoresists
- - R.D. Allen
- 1997
- Semiconductor International
Ionized magnetron sputtering for lining and filling trenches and vias
- - S.M. Rossnagel
- 1996
- Semiconductor International
Ionized magnetron sputtering for lining and filling trenches and vias
- - S.M. Rossnagel
- 1996
- Semiconductor International
THIN FILM TECHNOLOGY FOR ADVANCED SEMICONDUCTORS. PART 3: VLSI INTERCONNECT METALIZATION.
- - P.S. Ho
- 1985
- Semiconductor International