EUV mask challenges and requirements for ultimate single exposure interconnects
- Chris Progler
- Michael Green
- et al.
- 2019
- SPIE Advanced Lithography 2019
Nelson Felix
Title
Director, Technical Business Development - IBM Semiconductors
Publications
Investigation of mask absorber induced image shift in EUV lithography
- Martin Burkhardt
- Anuja De Silva
- et al.
- 2019
- SPIE Advanced Lithography 2019
Defect detection strategies and process partitioning for single-expose EUV patterning
- Luciana Meli
- Karen Petrillo
- et al.
- 2019
- J. Micro/Nanolithogr. MEMS MOEMS
Self-aligned blocking integration demonstration for critical sub-30-nm pitch Mx level patterning with EUV self-aligned double patterning
- Angelique Raley
- Joe Lee
- et al.
- 2019
- J. Micro/Nanolithogr. MEMS MOEMS
Patterning material challenges for improving euv stochastics
- Anuja De Silva
- Luciana Meli
- et al.
- 2019
- J. Photopolym. Sci. Tech.
Inorganic hardmask development for extreme ultraviolet patterning
- Anuja De Silva
- A. Dutta
- et al.
- 2019
- J. Micro/Nanolithogr. MEMS MOEMS
Directed self-assembly of block copolymers for 7 nanometre FinFET technology and beyond
- Charlie Liu
- Elliott Franke
- et al.
- 2018
- Nature Electronics
Track based techniques to improve high-resolution EUV patterning defectivity
- Naoki Shibata
- Lior Huli
- et al.
- 2018
- EUVL 2018
Study of resist hardmask interaction through surface activation layers
- Anuja De Silva
- Luciana Meli
- et al.
- 2018
- EUVL 2018
Defect detection strategies and process partitioning for SE EUV patterning
- Luciana Meli
- Karen Petrillo
- et al.
- 2018
- SPIE Advanced Lithography 2018
Patents
- US
- 12261044
- US
- 12021135
- US
- 12019376
- CN
- ZL 2018 8 0081456.1
- US
- 11804401
- US
- 11699592
- US
- 11695059
- US
- 11681213
- US
- 11682558
- US
- 11646221
Blog posts
IBM and Albany partners unlock new yield benchmarks for EUV patterning
Technical noteLuciana Meli and Nelson FelixEUV patterning yield breakthrough sets new benchmark for logic scaling
Technical noteNelson Felix and Luciana Meli4 minute readIBM Research at SPIE 2020: New architectures and fabrications for AI hardware
ResearchNelson Felix4 minute read
Top collaborators
LM
Luciana Meli
Senior Manager: Patterning & Metrology
NL
Nicolas Loubet
STSM, Advanced Logic Technology Research
MB
Mary Breton
Technical Assistant to Huiming Bu | Semiconductor Enablement Program Management & Infrastructure
HB
Huiming Bu
Vice President: IBM Semiconductors Global R&D and Albany Operations