Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A model for the oxide breakdown (BD) current-voltage (I-V) characteristics has been experimentally verified on CMOS inverters. The implications of oxide BD on the performance of various CMOS circuit elements are discussed. Examples are shown of cell stability and bitline differentials in static memory (SRAM), signal timing, and inverter chains. © 2003 Elsevier Ltd. All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
P.C. Pattnaik, D.M. Newns
Physical Review B
Min Yang, Jeremy Schaub, et al.
Technical Digest-International Electron Devices Meeting
Sharee J. McNab, Richard J. Blaikie
Materials Research Society Symposium - Proceedings