Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
This paper provides a detailed description of the IBM SiGe BiCMOS and rf CMOS technologies. The technologies provide high-performance SiGe heterojunction bipolar transistors (HBTs) combined with advanced CMOS technology and a variety of passive devices critical for realizing an integrated mixed-signal system-on-a-chip (SoC). The paper reviews the process development and integration methodology, presents the device characteristics, and shows how the development and device selection were geared toward usage in mixed-signal IC development.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Elliot Linzer, M. Vetterli
Computing
Fan Zhang, Junwei Cao, et al.
IEEE TETC
Alessandro Morari, Roberto Gioiosa, et al.
IPDPS 2011