Erin L. Jablonski, Vivek M. Prabhu, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
The dynamics of thin films photoresists polymers and incoherent neutron scattering were discussed. The elastic incoherent neutron scattering is used to parametrize changes in the atomic/molecular mobility in lithographic polymers. Results showed that a reduced Debye-Waller factor mean-square atomic displacement in thin model resist films corresponds to a decrease in the reaction front propagation kinetics.
Erin L. Jablonski, Vivek M. Prabhu, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Christopher L. Soles, Ronald L. Jones, et al.
Microlithography 2003
Dario L. Goldfarb, Qinhuang Lin, et al.
Proceedings of SPIE - The International Society for Optical Engineering
Christopher L. Soles, Eric K. Lin, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures