Silylation of resist materials using di- and polyfunctional organosilicon compounds
- E. Babich
- J. Paraszczak
- et al.
- 1990
- Microelectronic Engineering
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36 results for Jurij Paraszczak
A comparison of the E-beam sensitivities and relative O2-plasma stabilities of organosilicon polymers.Part III. Lithographic characteristics of poly-1,1,3-trimethyl-1-sila - and poly-1,1,3,3-tetramethyl-1,3- disilacyclobutenes and related silmethylene polymers
- E. Babich
- J. Paraszczak
- et al.
- 1989
- Microelectronic Engineering
A study of the chemical and physical interaction between copper and polyimide
- D.Y. Shih
- J. Paraszczak
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Using surface wave produced plasmas to determine the frequency effect upon etching of polyimide in RF and microwave sustained plasmas
- G. Sauvé
- M. Moisan
- et al.
- 1989
- Microelectronic Engineering
Influence of the applied field frequency (27-2450 MHz) in high-frequency sustained plasmas used to etch polyimide
- G. Sauvé
- M. Moisan
- et al.
- 1988
- Applied Physics Letters
X-ray photoelectron and infrared spectroscopy of microwave plasma etched polyimide surfaces
- N.J. Chou
- J. Paraszczak
- et al.
- 1987
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A comparison of the E-beam and UV-sensitivities and relative O2- plasma stabilities of organosilicon polymers.Part II. Lithographic characteristics of polysilphenylene siloxanes and some organic polymers with pendant silyl groups
- E. Babich
- J.M. Shaw
- et al.
- 1987
- Microelectronic Engineering
The use of organosilicon polymers in multilayer plasma resist processing
- J. Paraszczak
- E. Babich
- et al.
- 1987
- Microelectronic Engineering
Ion energy and anisotropy in microwave plasma etching of polymers
- J. Heidenreich
- J. Paraszczak
- et al.
- 1986
- Microelectronic Engineering
Diazopolysiloxanes: Unique imageable barrier layers
- E. Babich
- J.M. Shaw
- et al.
- 1986
- Microelectronic Engineering