Development of APSM resists for sub-200 nm contact holes
- M. Rajaratnam
- M. Reilly
- et al.
- 1999
- Microelectronic Engineering
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127 results for Hiroshi Ito
Cyclic olefm resist polymers and polymerizations for improved etch resistance
- R.D. Allen
- Juliann Opitz
- et al.
- 1999
- J. Photopolym. Sci. Tech.
Factors controlling pattern formation in chemically amplified resists at sub-100 nm dimensions
- W.D. Hinsberg
- F.A. Houle
- et al.
- 1999
- J. Photopolym. Sci. Tech.
IBM 193nm semiconductor resist: Material properties, resist characteristics and lithographic performance
- P. Rao Varanasi
- Ann Marie Mewherter
- et al.
- 1999
- J. Photopolym. Sci. Tech.
Investigation of deep UV resists by NMR: Residual casting solvents, chemistries, and PAG decomposition in film
- Hiroshi Ito
- Mark Sherwood
- 1999
- J. Photopolym. Sci. Tech.
The "living" free radical synthesis of poly(4-hydroxystyrene): Physical properties and dissolution behavior
- G.G. Barclay
- C.J. Hawker
- et al.
- 1998
- Macromolecules
Evolution and progress of deep uv resist materials
- Hiroshi Ito
- 1998
- J. Photopolym. Sci. Tech.
Design, preparation, characterization, and lithographic imaging of high performance chemically amplified deep UV resist
- Hiroshi Ito
- G. Breyta
- et al.
- 1997
- ACS Spring 1997
The "living" free radical synthesis of random and block copolymere containing hydrophobic and hydrophilic moieties: Novel thin film dissolution behavior
- G.G. Barclay
- M. King
- et al.
- 1997
- American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
Chemical amplification resists: History and development within IBM
- Hiroshi Ito
- 1997
- IBM J. Res. Dev