Magnetic tunnel junctions fabricated at tenth-micron dimensions by electron beam lithography
- S. Rishton
- Y. Lu
- et al.
- 1997
- Microelectronic Engineering
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29 results for R. Viswanathan
X-ray lithography for ≤100 nm ground rules in complex patterns
- Scott Hector
- Victor Pol
- et al.
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
CMOS scaling into the nanometer regime
- Yuan Taur
- Douglas A. Buchanan
- et al.
- 1997
- Proceedings of the IEEE
Lithography and fabrication processes for sub-100 nm scale complementary metal-oxide semiconductor
- S.J. Wind
- Y. Taur
- et al.
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
High-accuracy defect-free X-Ray mask technology
- Steven C. Nash
- Thomas B. Faure
- et al.
- 1994
- Japanese Journal of Applied Physics
Fabrication of high performance 512Kb SRAMs in 0.25 μm CMOS technology using x-ray lithography
- R. Viswanathan
- David Seeger
- et al.
- 1994
- Microelectronic Engineering
Fully scaled 0.5μm MOS circuits by synchrotron radiation X-ray lithography: Mask fabrication and chraterization
- R. Viswanathan
- R.E. Acosta
- et al.
- 1989
- Microelectronic Engineering
Electrical resistivity and radiation damage in boro-hydro-nitride x-ray lithography mask substrates
- S.S. Dana
- J. Batey
- et al.
- 1987
- Microelectronic Engineering
Distortion of masks for x-ray lithography
- R.E. Acosta
- J.R. Maldonado
- et al.
- 1985
- Microelectronic Engineering