Comparison of Cl2/He, Cl2/Ar, and Cl2/Xe plasma chemistries for dry etching of NiFe and NiFeCo
- K.B. Jung
- H. Cho
- et al.
- 1999
- JES
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16 results for S.J. Pearton
Interhalogen Plasma Chemistries for the Etching of NiMnSb
- H. Cho
- K.B. Jung
- et al.
- 1999
- Electrochemical and Solid-State Letters
Patterning of NiFe and NiFeCo in CO/NH3 high density plasmas
- K.B. Jung
- J. Hong
- et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Interhalogen plasma chemistries for dry etch patterning of Ni, Fe, NiFe and NiFeCo thin films
- H. Cho
- K.B. Jung
- et al.
- 1999
- Applied Surface Science
Comparison of Cl2 and F2 based chemistries for the inductively coupled plasma etching of NiMnSb thin films
- J. Hong
- J.A. Caballero
- et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
High density plasma etching of NiFe, NiFeCo and NiMnSb-based multilayers for magnetic storage elements
- K.B. Jung
- J. Hong
- et al.
- 1999
- Applied Surface Science