Multiplexed phase-conjugate holographic storage using an intermediate buffer hologram
- G.W. Burr
- H. Coufal
- et al.
- 2000
- SPIE Optical Science and Technology 2000
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80 results for J. Hoffnagle
Design and performance of a refractive optical system that converts a Gaussian to a flattop beam
- John A. Hoffnagle
- C. Michael Jefferson
- 2000
- Applied Optics
Real-time analysis of volatiles formed during processing of a chemically amplified resist
- F.A. Houle
- G.M. Poliskie
- et al.
- 2000
- Microlithography 2000
Effect of resist components on image spreading during postexposure bake of chemically amplified resists
- W.D. Hinsberg
- F.A. Houle
- et al.
- 2000
- Microlithography 2000
Aerial image contrast using interferometric lithography: Effect on line-edge roughness
- M.I. Sanchez
- W.D. Hinsberg
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Experimental method for quantifying acid diffusion in chemically amplified resists
- G.M. Wallraff
- W.D. Hinsberg
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Chemistry controlling nanoscale pattern formation by deep UV photolithography
- F.A. Houle
- W.D. Hinsberg
- et al.
- 1999
- ACS Spring 1999
Intensity-dependent polarization correlations in the field-free 6s to 7s to 15p two-photon transition of caesium
- N. Schlumpf
- V.L. Telegdi
- et al.
- 1999
- Journal of Physics B
Factors controlling pattern formation in chemically amplified resists at sub-100 nm dimensions
- W.D. Hinsberg
- F.A. Houle
- et al.
- 1999
- J. Photopolym. Sci. Tech.
Liquid immersion deep-ultraviolet interferometric lithography
- J. Hoffnagle
- W.D. Hinsberg
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures