Impact of thin resist processes on post-etch LER
- Arpan P. Mahorowala
- Dario L. Goldfarb
- et al.
- 2003
- Microlithography 2003
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69 results for Dario Goldfarb
Polyelectrolyte effects in model photoresist developer solutions: Roles of base concentration and added salts
- Vivek M. Prabhu
- Ronald L. Jones
- et al.
- 2003
- Microlithography 2003
Deprotection volume characteristics and line edge morphology in chemically amplified resists
- Ronald L. Jones
- Tengjiao Hu
- et al.
- 2003
- Microlithography 2003
X-ray absorption spectroscopy to probe interfacial issues in photolithography
- Joseph L. Lenhart
- Daniel A. Fischer
- et al.
- 2003
- Microlithography 2003
Diffusion induced line edge roughness
- Michael D. Stewart
- Gerard M. Schmid
- et al.
- 2003
- Microlithography 2003
Incoherent neutron scattering and the dynamics of thin film photoresist polymers
- Christopher L. Soles
- Jack F. Douglas
- et al.
- 2003
- Journal of Applied Physics
Probing surface and bulk chemistry in resist films using near edge x-ray absorption fine structure
- Joseph L. Lenhart
- Ronald L. Jones
- et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Enhancement of KRS-XE for 50 keV advanced mask making applications
- Karen Petrillo
- David Medeiros
- et al.
- 2002
- SPIE Photomask Technology 2002
Combinatorial methodologies offer potential for rapid research of photoresist materials and formulations
- Joseph L. Lenhart
- Ronald L. Jones
- et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Chain conformation in ultrathin polymer films
- Ronald L. Jones
- Christopher L. Soles
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering