Development of stacking faults in strained silicon layers
- S.W. Bedell
- A. Reznicek
- et al.
- 2005
- IEEE International SOI Conference 2005
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28 results for Anthony Domenicucci
Characterization of ultra thin SOI and SSOI substrates: Defect and strain analysis
- S.W. Bedell
- H.J. Hovel
- et al.
- 2005
- ECS Meeting 2005
A hydrogen pre-bake process for Si epitaxy on sige surface
- H. Chen
- S.W. Bedell
- et al.
- 2004
- ECS Meeting 2004
A survey of defects in strained Si layers
- S.W. Bedell
- H. Chen
- et al.
- 2004
- MRS Proceedings 2004
Reduced Cu interface diffusion by CoWP surface coating
- C.-K. Hu
- L. Gignac
- et al.
- 2003
- Microelectronic Engineering
Cleans for Al vias in a 0.175 μm Dual Damascene Process
- J.P. Gambino
- L. Clevenger
- et al.
- 1999
- IITC 1999
Formation of Si:CP layer through in-situ doping and implantation process for n-type metal-oxide-semiconductor devices
- Shogo Mochizuki
- Rainer Loesing
- et al.
- 2014
- Thin Solid Films
Dual-lens electron holography for junction profiling and strain mapping on semiconductor devices
- Yun-Yu Wang
- Anthony Domenicucci
- et al.
- 2014
- Electronic Device Failure Analysis
Strain mapping of Si devices with stress memorization processing
- Y.Y. Wang
- John Bruley
- et al.
- 2013
- Applied Physics Letters
Variable magnification dual lens electron holography for semiconductor junction profiling and strain mapping
- Y.Y. Wang
- J. Li
- et al.
- 2013
- Ultramicroscopy