Development of 157 nm positive resists
- Hiroshi Ito
- G.M. Wallraff
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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88 results for Phil Brock
Novel fluoropolymers for use in 157 nm lithography
- Hiroshi Ito
- G.M. Wallraff
- et al.
- 2001
- J. Photopolym. Sci. Tech.
Role of CsF on electron injection into a conjugated polymer
- Pongpun Piromreun
- HwanSool Oh
- et al.
- 2000
- Applied Physics Letters
Charge transport processes in organic light-emitting devices
- J. Campbell Scott
- Phillip J. Brock
- et al.
- 2000
- Synthetic Metals
193 nm positive tone bilayer resist based on norbornene-maleic anhydride copolymers
- R. Sooriyakumaran
- D. Fenzel-Alexander
- et al.
- 2000
- Microlithography 2000
Effect of resist components on image spreading during postexposure bake of chemically amplified resists
- W.D. Hinsberg
- F.A. Houle
- et al.
- 2000
- Microlithography 2000
Bias-tuned reduction of self-absorption in polymer blend electroluminescence
- B. Ruhstaller
- J.C. Scott
- et al.
- 2000
- Chemical Physics Letters
Lithographic techniques for the fabrication of oligonucleotide arrays
- G.M. Wallraff
- W.D. Hinsberg
- et al.
- 2000
- J. Photopolym. Sci. Tech.
Progress in 193nm resists: Impact of the development process on anhydride-containing resist materials
- Robert D. Allen
- Carl E. Larson
- et al.
- 2000
- J. Photopolym. Sci. Tech.
Effect of thermal annealing on the optical and morphological properties of (AETH)PbX4 (X = Br, I) perovskite films prepared using single source thermal ablation
- Konstantinos Chondroudis
- David B. Mitzi
- et al.
- 1999
- Chemistry of Materials