Chip-level power-performance optimization through thermally-driven across-chip variation (ACV) reductionX. YuOleg Gluschenkovet al.2011IEDM 2011
Direct silicon bonded (DSB) substrate solid phase epitaxy (SPE) integration scheme study for high performance bulk CMOSHaizhou YinC.Y. Sunget al.2006IEDM 2006
Novel enhanced stressor with graded embedded SiGe source/drain for high performance CMOS devicesJ.-P. HanH. Utomoet al.2006IEDM 2006
High performance CMOS bulk technology using direct silicon bond (DSB) mixed crystal orientation substratesChun-Yung SungHaizhou Yinet al.2005IEDM 2005
Design of high performance PFETs with strained Si channel and laser annealZ. LuoY.F. Chonget al.2005IEDM 2005
High Performance CMOS Fabricated on Hybrid Substrate with Different Crystal OrientationsM. YangM. Ieonget al.2003IEDM 2003
Blanket SMT with in situ N2 plasma treatment on the lang;100〉 wafer for the low-cost low-power technology applicationJun YuanVictor Chanet al.2009IEEE Electron Device Letters
A 45nm low power bulk technology featuring carbon co-implantation and laser anneal on 45°-rotated substrateJ. YuanV. Chanet al.2008ICSICT 2008
Channel Strain Characterization in Embedded SiGe by Nano-beam DiffractionJ. LiA. Lambertiet al.2008ECS Meeting 2008
Higher hole mobility induced by twisted Direct Silicon Bonding (DSB)M. HamaguchiH. Yinet al.2008VLSI Technology 2008