HIGH TEMPERATURE PROCESS LIMITATIONS ON TiSi//2.
- C.-Y. Ting
- F.M. d'Heurle
- et al.
- 1984
- ECS Meeting 1984
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159 results for F.M. D'Heurle
Silicide interfaces in silicon technology
- F.M. D'Heurle
- 1998
- Journal of Electronic Materials
Stability of interfaces in gold-silicon system regarding equilibrium segregation
- Andrée Rolland
- Christophe Poisson
- et al.
- 1997
- Microscopy Microanalysis Microstructures
Interactions Between Cr and Pt Films: New Cr-Pt Phases
- J.E.E. Baglin
- F.M. d'Heurle
- et al.
- 2019
- JES
Epitaxial Relations in Films of Cr, Pt, and CrPt on Sapphire
- J.E.E. Baglin
- F.M. d'Heurle
- 2019
- JES
Short Time Annealing of Coevaporated Tungsten Silicide Films
- T.O. Sedgwick
- F.M. d'Heurle
- et al.
- 2019
- JES
High temperature process limitation on TiSi2
- C.-Y. Ting
- F.M. d'Heurle
- et al.
- 2019
- JES
A Mathematical Model for Silicide Oxidation
- S.-L. Zhang
- R. Ghez
- et al.
- 2019
- JES
Kinetics of formation of silicides: A review
- F.M. d'Heurle
- P. Gas
- 2011
- Journal of Materials Research
Nucleation of a new phase from the interaction of two adjacent phases: Some silicides
- F.M. d'Heurle
- 2011
- Journal of Materials Research