Publications

221 results at Microelectronic Engineering

New high resolution and high sensitivity deep UV, x-ray, and electron beam resists
- - Michael Hatzakis
  - Kevin J. Stewart
  - et al.
- 1990
- Microelectronic Engineering
A simple bilayer lift-off process
- - David F. Witman
  - Jane M. Shaw
  - et al.
- 1990
- Microelectronic Engineering
Thermoelastic effects on x-ray lithography masks under pulsed irradiation
- - Iqbal Shareef
  - Juan R. Maldonado
  - et al.
- 1990
- Microelectronic Engineering
A comparison of the E-beam sensitivities and relative O₂-plasma stabilities of organosilicon polymers.Part III. Lithographic characteristics of poly-1,1,3-trimethyl-1-sila - and poly-1,1,3,3-tetramethyl-1,3- disilacyclobutenes and related silmethylene polymers
- - E. Babich
  - J. Paraszczak
  - et al.
- 1989
- Microelectronic Engineering
Application of variable shaped electron beam technology to the development of 0.5 micron CMOS technology with extensions to 0.25 micron
- - P. Coane
  - P. Rudeck
  - et al.
- 1989
- Microelectronic Engineering
Using surface wave produced plasmas to determine the frequency effect upon etching of polyimide in RF and microwave sustained plasmas
- - G. Sauvé
  - M. Moisan
  - et al.
- 1989
- Microelectronic Engineering
Nanolithography at 350 KV in a TEM
- - A.N. Broers
  - A.E. Timbs
  - et al.
- 1989
- Microelectronic Engineering
High speed electron beam testing
- - George Chiu
  - Jean-Marc Halbout
  - et al.
- 1989
- Microelectronic Engineering
Fully scaled 0.5μm MOS circuits by synchrotron radiation X-ray lithography: Mask fabrication and chraterization
- - R. Viswanathan
  - R.E. Acosta
  - et al.
- 1989
- Microelectronic Engineering
Electron beam lithography of sub-0.1μm circuits
- - S. Rishton
  - D. Kern
  - et al.
- 1989
- Microelectronic Engineering