A simple bilayer lift-off process
- David F. Witman
- Jane M. Shaw
- et al.
- 1990
- Microelectronic Engineering
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221 results at Microelectronic Engineering
Thermoelastic effects in x-ray lithography masks during synchrotron storage ring irradiation
- Y. Vladimirsky
- J.R. Maldonado
- et al.
- 1990
- Microelectronic Engineering
Thermoelastic effects on x-ray lithography masks under pulsed irradiation
- Iqbal Shareef
- Juan R. Maldonado
- et al.
- 1990
- Microelectronic Engineering
A comparison of the E-beam sensitivities and relative O2-plasma stabilities of organosilicon polymers.Part III. Lithographic characteristics of poly-1,1,3-trimethyl-1-sila - and poly-1,1,3,3-tetramethyl-1,3- disilacyclobutenes and related silmethylene polymers
- E. Babich
- J. Paraszczak
- et al.
- 1989
- Microelectronic Engineering
Highly selective KOH-based etchant for boron-doped silicon structures
- E. Bassous
- A.C. Lamberti
- 1989
- Microelectronic Engineering
Fully scaled 0.5 μm MOS circuits by synchrotron radiation X-ray lithography: Devices fabrication and overlay evaluation
- J. Silverman
- V. Dimilia
- et al.
- 1989
- Microelectronic Engineering
Application of variable shaped electron beam technology to the development of 0.5 micron CMOS technology with extensions to 0.25 micron
- P. Coane
- P. Rudeck
- et al.
- 1989
- Microelectronic Engineering
Using surface wave produced plasmas to determine the frequency effect upon etching of polyimide in RF and microwave sustained plasmas
- G. Sauvé
- M. Moisan
- et al.
- 1989
- Microelectronic Engineering
Chemically assisted ion beam etching process for high quality laser mirrors
- P. Buchmann
- H.P. Dietrich
- et al.
- 1989
- Microelectronic Engineering
Electron beam lithography of sub-0.1μm circuits
- S. Rishton
- D. Kern
- et al.
- 1989
- Microelectronic Engineering