Publications

221 results at Microelectronic Engineering

Determination of proximity effect correction parameters for 0.1 μm electron-beam lithography
- - Michael G. Rosenfield
  - S.J. Wind
  - et al.
- 1990
- Microelectronic Engineering
CW and time resolved luminescence study of dry etch damage in semiconductor wires
- - B.E. Maile
  - G. Mayer
  - et al.
- 1990
- Microelectronic Engineering
Silylation of resist materials using di- and polyfunctional organosilicon compounds
- - E. Babich
  - J. Paraszczak
  - et al.
- 1990
- Microelectronic Engineering
High speed electron beam testing
- - George Chiu
  - Jean-Marc Halbout
  - et al.
- 1989
- Microelectronic Engineering
Chemically assisted ion beam etching process for high quality laser mirrors
- - P. Buchmann
  - H.P. Dietrich
  - et al.
- 1989
- Microelectronic Engineering
Using surface wave produced plasmas to determine the frequency effect upon etching of polyimide in RF and microwave sustained plasmas
- - G. Sauvé
  - M. Moisan
  - et al.
- 1989
- Microelectronic Engineering
A Single Expose Double Develop (SEDD) process for self-aligned lithographic applications
- - Donis Flagello
  - Andrew Pomerene
- 1989
- Microelectronic Engineering
Fully scaled 0.5 μm MOS circuits by synchrotron radiation X-ray lithography: Devices fabrication and overlay evaluation
- - J. Silverman
  - V. Dimilia
  - et al.
- 1989
- Microelectronic Engineering
Nanolithography at 350 KV in a TEM
- - A.N. Broers
  - A.E. Timbs
  - et al.
- 1989
- Microelectronic Engineering
Highly selective KOH-based etchant for boron-doped silicon structures
- - E. Bassous
  - A.C. Lamberti
- 1989
- Microelectronic Engineering