Dynamics of the Desorption of D2and H2from Cu(111)
- C.T. Rettner
- H.A. Michelsen
- et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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357 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Scanning Tunneling Microscope Tip-Sample Interactions: Atomic Modification of Si and Nanometer Si Schottky Diodes
- Ph. Avouris
- I.-W. Lyo
- et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Trapping and Behavior of Particulates in a Radio Frequency Magnetron Plasma Etching Tool
- Edward F. Patterson
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Growth and Morphology of Partial and Multilayer Fe Thin Films on Cu(100) and the Effect of Adsorbed Gases Studied by Scanning Tunneling Microscopy
- K. Johnson
- D.D. Chambliss
- et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Electroluminescence and Photoluminescence from Microporous Silicon p-n Junctions
- V.P. Kesan
- E. Bassous
- et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Preparation of low resistivity Cu-1 at. %Cr thin films by magnetron sputtering
- C. Cabral
- J.M.E. Harper
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Spin superlattice formation in ZnSe-based diluted magnetic semiconductor heterostructures
- B.T. Jonker
- W.C. Chou
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Plasma particulate contamination control. II. Self-cleaning tool design
- Gary S. Selwyn
- Edward F. Patterson
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Dopant diffusion in silicides: Effect of diffusion paths
- Carol Stanis
- J.M. Cotte
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Temperature optimization in an azimuthally symmetric single-wafer chemical vapor deposition reactor: The low pressure regime
- David E. Kotecki
- Steven G. Barbee
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films