Heng Wu, Soon-Cheon Seo, et al.
IEDM 2017
In our study, we evaluate effective silicon and germanium oxide reduction by two surface treatments to achieve low contact resistivity at the semiconductor/metal interface. These chemistries, one alkaline and the other an acidic fluorine-based treatment, were utilized on epitaxial n-type Si
Heng Wu, Soon-Cheon Seo, et al.
IEDM 2017
Praneet Adusumilli, A. Carr, et al.
IITC/AMC 2016
Heng Wu, Oleg Gluschenkov, et al.
IEDM 2018
Zhen Zhang, Siyuranga Obasa Koswatta, et al.
IEEE Electron Device Letters