Probabilistic model for the mechanism of phenolic polymer dissolution
- Lewis W. Flanagin
- Christopher L. McAdams
- et al.
- 1998
- Microlithography 1998
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120 results for William D. Hinsberg
Deep-ultraviolet interferometric lithography as a tool for assessment nf chemically amplified photoresist performance
- W.D. Hinsberg
- F.A. Houle
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Stochastic simulation of heat flow with application to laser-solid interactions
- F.A. Houle
- W.D. Hinsberg
- 1998
- Applied Physics A: Materials Science and Processing
The mechanism of phenolic polymer dissolution: A new perspective
- Pavlos C. Tsiartas
- Lewis W. Flanagin
- et al.
- 1997
- Macromolecules
Mechanistic studies of chemically amplified photoresists
- W.D. Hinsberg
- G.M. Wallraff
- et al.
- 1997
- American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
DNA sequencing on a chip
- G.M. Wallraff
- T. Nguyen
- et al.
- 1997
- CHEMTECH
Toughened, inorganic-organic hybrid materials for microelectronic application
- J.L. Hedrick
- S.A. Srinivasan
- et al.
- 1996
- MRS Fall Meeting 1996
Light-directed synthesis of high-density oligonucleotide arrays using semiconductor photoresists
- Glenn Mcgall
- Jeff Labadie
- et al.
- 1996
- PNAS
Structure in thin and ultrathin spin-cast polymer films
- Curtis W. Frank
- V. Rao
- et al.
- 1996
- Science
Application of semiconductor lithography to the fabrication of oligonucleotide arrays
- G.M. Wallraff
- Jeff W. Labadie
- et al.
- 1996
- IS&T Annual Conference 1996