Photoresists for 193-nm lithography
- R.D. Allen
- G.M. Wallraff
- et al.
- 1997
- IBM J. Res. Dev
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101 results for Gregory M. Wallraff
Light-directed synthesis of high-density oligonucleotide arrays using semiconductor photoresists
- Glenn Mcgall
- Jeff Labadie
- et al.
- 1996
- PNAS
Application of semiconductor lithography to the fabrication of oligonucleotide arrays
- G.M. Wallraff
- Jeff W. Labadie
- et al.
- 1996
- IS&T Annual Conference 1996
Progress in 193 nm positive resists
- R.D. Allen
- R. Soortyakumaran
- et al.
- 1996
- J. Photopolym. Sci. Tech.
Correlation of UVIIHS resist chemistry to dissolution rate measurements
- J. Thackeray
- T.H. Fedynyshyn
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
193 nm photoresist r&d: the risk & challenge
- Donald C. Hofer
- Robert Allen
- et al.
- 1996
- J. Photopolym. Sci. Tech.
Kinetics of chemically amplified resists
- G.M. Wallraff
- W.D. Hinsberg
- et al.
- 1995
- Microlithography 1995
193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system
- R.D. Allen
- G.M. Wallraff
- et al.
- 1995
- Microlithography 1995
Resolution and etch resistance of a family of 193 nm positive resists
- R.D. Allen
- I.Y. Wan
- et al.
- 1995
- J. Photopolym. Sci. Tech.
Kinetics of thermal and acid-catalyzed deprotection in deep-UV resist materials
- G.M. Wallraff
- John M. Hutchinson
- et al.
- 1995
- Microelectronic Engineering