Acid-base reactions in a positive tone chemically amplified photoresist and their effect on imaging
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.