Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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75 results for Christopher P. D’Emic

Effects of film reoxidation on the growth and material properties of ultrathin dielectrics grown by rapid thermal nitridation in ammonia
- - C. D'Emic
  - J.S. Newbury
  - et al.
- 2008
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Bias-temperature instabilities and radiation effects in MOS devices
- - X.J. Zhou
  - D.M. Fleetwood
  - et al.
- 2005
- IEEE TNS
Charge trapping and annealing in high-k gate dielectrics
- - James A. Felix
  - Marty R. Shaneyfelt
  - et al.
- 2004
- IEEE TNS
Nitrogen interface engineering in Al ₂O ₃ capacitors for improved thermal stability
- - P.D. Kirsch
  - D.-G. Park
  - et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Negative bias-temperature instabilities in metal-oxide-silicon devices with SiO ₂ and SiO _xN _y/HfO ₂ gate dielectrics
- - X.J. Zhou
  - L. Tsetseris
  - et al.
- 2004
- Applied Physics Letters
Universal tunneling behavior in technologically relevant P/N junction diodes
- - Paul M. Solomon
  - Jason Jopling
  - et al.
- 2004
- Journal of Applied Physics
Low-frequency noise and radiation response of metal-oxide-semiconductor transistors with Al ₂O ₃/SiO _xN _y/Si(100) gate stacks
- - H.D. Xiong
  - D.M. Fleetwood
  - et al.
- 2003
- Applied Physics Letters
Charge detrapping in HfO ₂ high-κ gate dielectric stacks
- - E. Gusev
  - C. D'Emic
- 2003
- Applied Physics Letters
Two gates are better than one
- - P. Solomon
  - K.W. Guarini
  - et al.
- 2003
- IEEE Circuits and Devices Magazine
Electron and hole mobility enhancement in strained SOI by wafer bonding
- - Lijuan Huang
  - Jack O. Chu
  - et al.
- 2002
- IEEE Transactions on Electron Devices