Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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68 results at J. Photopolym. Sci. Tech.

Factors controlling pattern formation in chemically amplified resists at sub-100 nm dimensions
- - W.D. Hinsberg
  - F.A. Houle
  - et al.
- 1999
- J. Photopolym. Sci. Tech.
Investigation of deep UV resists by NMR: Residual casting solvents, chemistries, and PAG decomposition in film
- - Hiroshi Ito
  - Mark Sherwood
- 1999
- J. Photopolym. Sci. Tech.
IBM 193nm semiconductor resist: Material properties, resist characteristics and lithographic performance
- - P. Rao Varanasi
  - Ann Marie Mewherter
  - et al.
- 1999
- J. Photopolym. Sci. Tech.
Diffusion and distribution studies of photoacid generators: Ion beam analysis in lithography
- - Narayan Sundararajan
  - Christopher F. Keimel
  - et al.
- 1999
- J. Photopolym. Sci. Tech.
Platform-dependent properties of 193nm single layer resists
- - Robert D. Allen
  - Thomas I. Wallow
  - et al.
- 1998
- J. Photopolym. Sci. Tech.
Evolution and progress of deep uv resist materials
- - Hiroshi Ito
- 1998
- J. Photopolym. Sci. Tech.
Optical properties of polyalicyclic polyimides
- - Toshihiko Matsumoto
  - Claudius Feger
- 1998
- J. Photopolym. Sci. Tech.
Etch selectivity of 4SiMA: Hydroxystyrene based copolymers. silicon chemistry for bilayer resist systems
- - G.M. Wallraff
  - Carl E. Larson
  - et al.
- 1998
- J. Photopolym. Sci. Tech.
The influence of photoacid structure on the design and performance of 193-nm resists
- - Robert D. Allen
  - Juliann Opitz
  - et al.
- 1997
- J. Photopolym. Sci. Tech.
Dissolution kinetics and PAG interaction of phenolic resins in chemically amplified resists
- - Hiroshi Ito
  - Debra-Fenzel Alexander
  - et al.
- 1997
- J. Photopolym. Sci. Tech.