High-performance nMOSFET with in-situ phosphorus-doped embedded Si:C (ISPD eSi:C) source-drain stressor

For the first time, embedded Si (eSi) was demonstrated to be a superior nMOSFET stressor compared to SMT or tensile liner (TL) stressors. eSi nMOSFET showed higher channel mobility and drive current over our best poly-gate 45nm-node nMOSFET with SMT and tensile liner stressors. In addition, eSi showed better scalability than SMT plus tensile liner stressors from 380nm to 190nm poly-pitches.